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US 7,365,338 B2Granted
Apparatus for generating a plurality of beamlets
AssigneeMapper Lithography IP B.V.
InventorPieter Kruit
Life of this patent
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Abstract
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Claims5
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a lens array with a plurality of lenses for refracting a diverging particle beam emitted by a particle source,
- said lens array being composed by an electrostatic lens array comprising at least two conducting plates provided with apertures, each said aperture having a center, said at least two conducting plates positioned in close proximity with and parallel to each other;
- and
- having an application means for applying a voltage difference between each of the at least two conducting plates, in which the apertures of each plate are substantially aligned with each other, such that an incoming particle beam not perpendicular to a lens plane of the at least two conducting plates passes through the centers of the apertures.
1 more element
Dependencies are inferred from the claim text.