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US 7,359,030 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKlaus Simon, Joeri Lof, Arthur Winfried Eduardus Minnaert, Erik Marie Jose Smeets
Life of this patent
Estimating the term…
Abstract
A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.
Claims19
A lithographic projection apparatus, comprising:
- a radiation system configured to supply a projection beam of radiation;
- a patterning structure configured to pattern the projection beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a fluid processing cell in fluid communication with a surface of a substrate held on the substrate table, wherein the fluid processing cell is configured so that a fluid can be brought into contact with the substrate so as to interact with the target portion, the fluid processing cell comprises a plurality of separate chambers in fluid communication with respective areas of a substrate held on the substrate table, and the fluid processing cell is configured so that different areas of the substrate may be subjected to different fluid processes simultaneously or to a fluid process and a radiation exposure process simultaneously.
3 more elements
A device manufacturing method, comprising:
- providing a substrate to a substrate table in a lithographic projection system;
- providing a projection beam of radiation using a radiation system;
- patterning the projection beam in its cross-section;
- projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material;
- and
- processing an area of the substrate by exposing it to a fluid that interacts therewith to effect a process while the substrate is held by the substrate table, wherein the area of the substrate does not include the target portion and the projecting and processing are carried out at least partially simultaneously.
3 more elements
A lithographic apparatus, comprising:
- a patterning structure support that is constructed to support a patterning structure, the patterning structure capable of patterning a beam of radiation;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned beam of radiation onto a target portion of the substrate;
- a fluid processing cell in fluid communication with a surface of a substrate held on the substrate table, the fluid processing cell comprising a plurality of separate chambers configured to not have fluid communication with one another and to simultaneously receive a fluid, wherein each chamber is configured to have fluid communication with a different area of the substrate.
1 more element
A device manufacturing method, comprising:
- providing a substrate;
- projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on the substrate;
- and
- processing an area of said substrate by exposing it to a fluid that interacts therewith, the area of the substrate not including the target portion, wherein the projecting and the processing are carried out at least partially simultaneously.
1 more element
Dependencies are inferred from the claim text.