Optical field concentrator using multiple low-index nano-layer configuration for CMOS compatible laser devices
AssigneeMassachusetts Institute of Technology
InventorsNing-Ning Feng, Jurgen Michel, Lionel C. Kimerling
Life of this patent
Estimating the term…
Abstract
An optical field concentrator includes a plurality of waveguide layers comprising high index materials having a first defined thickness. At least one nano-layer structure is positioned between said waveguide layers. The at least one nano-layer structure comprises low index materials having a second defined thickness that is smaller than the first defined thickness. A plurality of cladding layers are positioned between the waveguide layers and the at least one nano-layer structure. The cladding layers have a third defined thickness that is larger than the first defined thickness.
Claims21
An optical field concentrator comprising:
- a plurality of waveguide layers comprising high index materials having a first defined thickness;
- at least one nano-layer structure that is positioned between said waveguide layers, said at least one nano-layer structure comprising low index materials having a second defined thickness that is smaller than said first defined thickness;
- a plurality of cladding layers that are positioned above and below said waveguide layers and said at least one nano-layer structure, said cladding layers having a third defined thickness that is larger than said first defined thickness;
- and
- a low index region surrounding said waveguide layers, said at least one nano-layer, and said cladding layers, said low index region having a defined index of at most 1.46.
A waveguide structure comprising:
- a plurality of waveguide layers comprising high index materials having a first defined thickness;
- at least one nano-layer structure that is positioned between said waveguide layers, said at least one nano-layer structure comprising low index materials having a second defined thickness that is smaller than said first defined thickness;
- a plurality of cladding layers that are positioned above and below said waveguide layers and said at least one nano-layer structure, said cladding layers having a third defined thickness that is larger than said first defined thickness;
- and
- a low index region surrounding said waveguide layers, said at least one nano-layer, and said cladding layers, said low index region having a defined index of at most 1.46.
A method of forming an optical field concentrator comprising:
- forming a plurality of waveguide layers comprising high index materials having a first defined thickness;
- forming at least one nano-layer structure that is positioned between said waveguide layers, said at least one nano-layer structure comprising low index materials having a second defined thickness that is smaller than said first defined thickness;
- forming a plurality of cladding layers that are positioned above and below said waveguide layers and said at least one nano-layer structure, said cladding layers having a third defined thickness that is larger than said first defined thickness;
- forming a low index region surrounding said waveguide layers, said at least one nano-layer, and said cladding layers, said low index region having a defined index of at most 1.46.
Dependencies are inferred from the claim text.