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US 7,352,789 B2Granted
Laser light irradiation apparatus and laser light irradiation method
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorKoichiro Tanaka
Life of this patent
Estimating the term…
Abstract
Laser light is emitted from a laser oscillator, and the laser light is made to enter a beam expander optical system including a concave lens through a correction lens. The laser oscillator, the correction lens and the concave lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the concave lens is f, and a distance between the correction lens and the concave lens is X, the X satisfies b−3|f|≦X≦b+|f|.
Claims34
A laser light irradiation apparatus comprising:
- a laser oscillator;
- a beam expander optical system which laser light oscillated from the laser oscillator enters;
- and
- a correction lens disposed between the laser oscillator and the beam expander optical system, wherein
- the beam expander optical system includes a concave lens, and
- when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the concave lens is f, and a distance between the correction lens and the concave lens is X, the X satisfies b−3|f|≦X≦b+|f|.
3 more elements
A laser light irradiation apparatus comprising:
- a laser oscillator;
- a beam expander optical system which laser light oscillated from the laser oscillator enters;
- and
- a correction lens disposed between the laser oscillator and the beam expander optical system, wherein
- the beam expander optical system includes a first convex lens, and
- when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the first convex lens is f, and a distance between the correction lens and the first convex lens is X, the X satisfies b−3|f|≦X≦b+|f|.
3 more elements
A laser light irradiation method comprising the steps of:
- emitting laser light from a laser oscillator;
- and
- making the laser light enter a beam expander optical system including a concave lens through a correction lens, wherein
- the laser oscillator, the correction lens and the concave lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the concave lens is f, and a distance between the correction lens and the concave lens is X, the X satisfies b−3|f|≦X≦b+|f|.
1 more element
A laser light irradiation method comprising the steps of:
- emitting laser light from a laser oscillator;
- and
- making the laser light enter a beam expander optical system including a first convex lens through a correction lens, wherein
- the laser oscillator, the correction lens and the first convex lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the first convex lens is f, and a distance between the correction lens and the first convex lens is X, the X satisfies b−3|f|≦X≦b+|f|.
1 more element
A method for manufacturing a semiconductor device, comprising the steps of:
- forming a semiconductor film over a substrate;
- and
- irradiating the semiconductor film with laser light, wherein
- the laser light is emitted from a laser oscillator and passes through a correction lens and a beam expander optical system including a concave lens which are provided in order in a traveling direction of the laser light, and
- the laser oscillator, the correction lens and the concave lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the concave lens is f, and a distance between the correction lens and the concave lens is X, the X satisfies b−3|f|≦X≦b+|f|.
2 more elements
A method for manufacturing a semiconductor device, comprising the steps of:
- forming a semiconductor film over a substrate;
- and
- irradiating the semiconductor film with laser light, wherein
- the laser light is emitted from a laser oscillator and passes through a correction lens and a beam expander optical system including a first convex lens which are provided in order in a traveling direction of the laser light, and
- the laser oscillator, the correction lens and the first convex lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the first convex lens is f, and a distance between the correction lens and the first convex lens is X, the X satisfies b−3|f|≦X≦b+|f|.
2 more elements
Dependencies are inferred from the claim text.