Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsBernardus Antonius Johannes Luttikhuis, Erik Roelof Loopsta, Harmen Klaas Van Der Schoot, Fransicus Mathijs Jacobs
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Abstract
The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.
Claims19
A lithographic apparatus comprising:
- a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
- a first holder to hold said patterning device on a first surface of said patterning device, the first surface being on a side of the patterning device comprising a patterning surface of the patterning device or the side opposite thereto;
- and
- a second holder to hold said patterning device on a second surface of said patterning device, opposite to said first surface, said second holder, in use, supporting said patterning device substantially only in directions parallel to the second surface of the patterning device.
A device manufacturing method comprising:
- imparting a pattern onto a beam of radiation using a patterning device to form a patterned beam of radiation;
- projecting said patterned beam of radiation onto a substrate;
- holding said patterning device on a first surface of said patterning device, the first surface being on a side of the patterning device comprising a patterning surface of the patterning device or the side opposite thereto;
- and
- holding said patterning device on a second surface of said patterning device, opposite from said first surface, substantially only in directions parallel to the second surface of the patterning device.
Dependencies are inferred from the claim text.