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AssigneeEssilor International (Compagnie Generale d'Optique)
InventorsNathalie Landraud, Jacques Peretti, Frédéric Chaput, Georges Lampel, Jean-Pierre Boilot, Khalid Lahlil, Viatcheslav Safarov
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The invention generally concerns a method involving emitting polarization light waves through an aperture with a dimension of maximum size lower than or equal to 100 nm, wherein the aperture is circumferentially bound by an opaque area that prevents the light waves from being propagated outside the aperture during use, and wherein the emitted polarization light waves (1) contact a material layer comprising a photosensitive compound whose surface is located at a distance lower than 100 nm from said aperture, and (2) induce a topographic modification of the material layer. In this manner, a stable structure is printed in relief in the material layer without requiring any additional development step. The invention is applicable, in certain embodiments, to ophthalmic optics.
A method comprising emitting polarization light waves through an aperture with a dimension of maximum size lower than or equal to 100 nm, the aperture circumferentially bound by an opaque area that prevents the light waves from being propagated outside the aperture during use, wherein the emitted polarization light waves contact a material layer comprising a photosensitive compound whose surface is located at a distance lower than 100 nm from said aperture, and induce a topographic modification of the material layer thereby printing a stable structure in relief in the material layer without requiring any additional development step.
Dependencies are inferred from the claim text.