Method and apparatus for preventing baking chamber exhaust line clog
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChia-Tung Chang
Life of this patent
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Abstract
A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking chamber on a periodic basis. The temperature is between a temperature of the hot plate and a temperature that is less than a glass transition temperature of a film being treated.
Claims22
A method for preventing clogs in an exhaust line of a baking chamber having a hot plate, the method comprising:
- providing a supply of inert gas;
- heating the supply of inert gas to an elevated temperature;
- and
- ejecting the heated inert gas through the exhaust line of the baking chamber on a periodic basis;
- wherein the elevated temperature is between a hot plate temperature and a temperature that is less than a glass transition temperature (Tg) of a film being treated.
A system for preventing clogs in an exhaust line of a baking chamber having a hot plate, the system comprising:
- a supply of nitrogen gas;
- a heater for heating the supply of nitrogen gas to a temperature;
- and
- an ejector coupled to the exhaust line of the baking chamber for ejecting the heated supply of nitrogen gas through the exhaust line on a periodic basis;
- wherein the temperature is between a hot plate temperature and a temperature that is less than a glass transition temperature (Tg) of a material being treated.
An apparatus for preventing clogs in an exhaust line of a baking chamber having a hot plate, the apparatus comprising:
- a heater having an in-port and an out-port;
- a supply of fluid coupled to the in-port of the heater, wherein the heater heats the supply of fluid to a temperature;
- and
- an ejector coupled to the out-port of the heater for ejecting the heated supply of fluid through the exhaust line;
- wherein the temperature is between a temperature of the hot plate and a temperature that is less than a glass transition temperature (Tg) of a film being treated.
Dependencies are inferred from the claim text.