US 7,351,346 B2Granted

Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths

AssigneeAgoura Technologies, Inc.

InventorMichael J. Little

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Abstract

A method for forming a plurality of parallel metal lines on a substrate of thin film elastomeric material and a wire grid polarizer formed by such method. A sacrificial layer is formed by coating the substrate with a water soluble polymer while the substrate is stretched. The existing tensile force is removed, leaving an undulating topology of buckled sacrificial layer material. A masking layer is then deposited at an oblique angle and then fractured into parallel lines of material by application of a second tensile force. Unmasked portions of the sacrificial layer are removed by dry etch. A metallic layer is then deposited and a lift off process employed to remove remaining portions of the sacrificial layer and materials deposited thereover. Upon removal of the second tensile force, the substrate returns to its unstressed length with metal lines of predetermined periodicity thereon.

Claims18

Dependent claims

A method for forming a plurality of substantially-straight metallic lines of predetermined periodicity Λ on a thin film substrate of elastomeric material having an unstressed length, said method comprising the steps of:

a) applying a first uniaxial tensile force to stress said substrate whereby said substrate is elongated from said unstressed length to a first stressed length;
then
b) coating said elongated substrate with a sacrificial layer of material;
then
c) removing said first uniaxial tensile force from said coated substrate whereby said substrate assumes substantially said unstressed length and said material of said sacrificial layer buckles to assume a repetitive undulating topology of periodicity Λ;
then
d) depositing a masking layer of material at an oblique angle with respect to said buckled layer so that said material of said masking layer is arranged into regions of alternating thickness of periodicity Λ;
then
e) applying a second uniaxial tensile force that exceeds said first uniaxial tensile force to said substrate so that said substrate is elongated to a second stressed length exceeding said first stressed length whereby said material of said masking layer is fractured into a plurality of lines of periodicity Λ′;
then
f) removing regions of said sacrificial layer that lie between said lines of material of said masking layer;
then
g) depositing a metallic layer onto said substrate whereby said metallic layer overlies said lines of said masking layer and exposed portions of said substrate;
then
h) removing said lines of material of said masking layer, underlying portions of said sacrificial layer and portions of said metallic layer that overlie said lines of material of said masking layer, leaving parallel lines of said metallic layer of periodicity Λ′ that directly overlie said substrate;
and then
i) removing said second uniaxial tensile force from said substrate whereby said substate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ.

14 more elements

A wire grid polarizer formed by the process of:

a) applying a first uniaxial tensile force to stress a thin film substrate of elastomeric material having an unstressed length whereby said substrate is elongated from said unstressed length to a first stressed length;
then
b) coating said elongated substrate with a first layer of material;
then
c) removing said first uniaxial tensile force from said coated substrate whereby said substrate assumes substantially said unstressed length and said material of said first layer buckles to assume a repetitive undulating topology of periodicity Λ;
then
d) depositing a second layer of material at an oblique angle with respect to said buckled first layer so that said material of said second layer is arranged into regions of alternating thickness of periodicity Λ;
then
e) applying a second uniaxial tensile force that exceeds said first uniaxial tensile force to said substrate so that said substrate is elongated to a second stressed length exceeding said first stressed length whereby said material of said second layer is fractured into a plurality of lines of periodicity Λ′;
then
f) removing regions of said first layer that lie between said lines of material of said second layer;
then
g) depositing a metallic layer onto said lines of material and regions exposed by removal of said regions of said first layer whereby said metallic layer overlies said lines of said second layer and exposed portions of said substrate;
then
h) removing said lines of material of said second layer, underlying portions of said first layer and portions of said metallic layer that overlie said lines of material of said second layer, leaving lines of material of said metallic layer of periodicity Λ′ that directly overlie said substrate;
and then
i) removing said second uniaxial tensile force from said substrate whereby said substate is relaxed to substantially said unstressed length the periodicity of said lines of material of said metallic layer is reduced to Λ.

14 more elements

Dependencies are inferred from the claim text.