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US 7,348,567 B1Granted
Apparatus for generating a plurality of beamlets
AssigneeMapper Lithography IP B.V.
InventorPieter Kruit
Life of this patent
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Abstract
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Claims22
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source, for a diverging charged particle beam generated by said source;
- a lens array comprising a plurality of lenses;
- splitting means comprising a spatial filter comprising an aperture array, for splitting said charged particle beam in a plurality of charged particle beamlets;
- said splitting means being aligned with said lens array for providing each lens with an individual beamlet.
1 more element
Dependencies are inferred from the claim text.