Contamination monitoring and control techniques for use with an optical metrology instrument
AssigneeMetroSol, Inc.
InventorsDale A. Harrison, Matthew Weldon
Life of this patent
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AssigneeMetroSol, Inc.
InventorsDale A. Harrison, Matthew Weldon
Estimating the term…
A technique is provided monitoring and removing contaminants from the surface of a sample that is being measured with an optical metrology tool. The monitoring and removing contaminants from the surface of a sample may occur prior to recording an optical response from said sample in order to ensure that accurate results are obtained. Contaminant layers may be quantified so that other measurements may be accurately obtained without requiring the removal of the contaminant layer. The contaminant layers may be removed through the exposure to optical radiation. Alternatively, properties of non-contaminant layers may be characterized by analyzing changes that occur in such layers by exposure to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
A method of cleaning a sample from which optical data is desired to be obtained through the use of an optical metrology tool, comprising:
A method of cleaning a sample from which optical data is desired to be obtained through the use of an optical metrology tool, comprising:
A method of obtaining optical data from a sample through the use of an optical metrology tool, comprising:
A method of obtaining optical data from a sample through the use of an optical metrology tool, comprising:
Dependencies are inferred from the claim text.