US 7,316,844 B2Granted

Spin-on protective coatings for wet-etch processing of microelectronic substrates

AssigneeBrewer Science Inc.

InventorsChenghong Li, Kimberly A. Ruben, Tony D. Flaim

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Abstract

New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and optionally other addition-polymerizable monomers such as (meth)acrylate monomers, vinylbenzyl chloride, and diesters of maleic acid or fumaric acid. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.

Claims16

Dependent claims

A microelectronic structure comprising:

a microelectronic substrate having a surface;
a primer layer adjacent said substrate surface, said primer layer comprising a silane having the structure
each of i,j, and k is individually selected from the group consisting of 0 and 1, and if one of i and j is 1, then the other of i and j is 0;
each R3 is individually selected from the group consisting of hydrogen, the halogens, C1-C8 alkyls, C1-C8 alkoxys, C1-C8 haloalkyls, aminos, and C1-C8 alkylaminos;
each R4 is individually selected from the group consisting of C1-C8 aliphatic groups;
each X is individually selected from the group consisting of halogens, hydroxyls, C1-C4 alkoxys and C1-C4 carboxyls;
Y is selected from the group consisting of oxygen and sulfur;
Z is selected from the group consisting of nitrogen and phosphorus;
and
each d is individually selected from the group consisting of 0 and 1;
a first protective layer adjacent said primer layer, said first protective layer including a polymer comprising recurring monomers having the respective formulas
wherein:
each R1 is individually selected from the group consisting of hydrogen and C1-C8 alkyls;
and
each R2 is individually selected from the group consisting of hydrogen, C1-C8 alkyls, and C1-C8 alkoxys;
and
a second protective layer adjacent said first protective layer, said second protective layer comprising a halogenated polymer.

14 more elements

Dependencies are inferred from the claim text.