Non-volatile memory cells, memory arrays including the same and methods of operating cells and arrays
AssigneeMacronix International Co., Ltd.
InventorHang-Ting Lue
Life of this patent
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Abstract
Memory cells comprising: a semiconductor substrate having a source region and a drain region disposed below a surface of the substrate and separated by a channel region; a tunnel dielectric structure disposed above the channel region, the tunnel dielectric structure comprising at least one layer having a small hole-tunneling-barrier height; a charge storage layer disposed above the tunnel dielectric structure; an insulating layer disposed above the charge storage layer; and a gate electrode disposed above the insulating layer are described along with arrays thereof and methods of operation.
Claims11
A method of operating a memory array comprising a plurality of memory cells disposed on a semiconductor substrate, wherein each of said memory cells comprises:
- a source region and a drain region disposed below a surface of the substrate and separated by a channel region;
- a tunnel dielectric structure disposed above the channel region, the tunnel dielectric structure comprising at least one layer having a small hole-tunneling-barrier height;
- a charge storage layer disposed above the tunnel dielectric structure;
- an insulating layer disposed above the charge storage layer;
- and a gate electrode disposed above the insulating layer;
- the method comprising:
- applying self-converging reset/erase voltages to the substrate and the gate electrode in each memory cell to be reset/erased;
- programming at least one of the plurality of memory cells;
- and
- reading at least one of the plurality of memory cells by applying a voltage between an erased state level and a programmed state level of at least one of the memory devices.
Dependencies are inferred from the claim text.