Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis

A system configured to reduce distortion of a resist during a metrology process, comprising:

• an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen;
• and
• a drying subsystem coupled to the electron beam metrology tool, wherein the drying subsystem is configured to reduce moisture proximate the specimen during measurements by the electron beam metrology tool such that the one or more resist features are not substantially distorted during the measurements.

A system configured to reduce alteration of a specimen during analysis, comprising:

• a vacuum chamber in which the specimen is disposed during the analysis;
• and
• an element disposed within the vacuum chamber, wherein a surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause reduction in a dimension of a resist structure formed on the specimen during the analysis.

A system configured to analyze a specimen, comprising:

• an analysis subsystem configured to analyze the specimen while the specimen is disposed in a vacuum chamber;
• and
• an element disposed within the vacuum chamber, wherein a surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause reduction in a dimension of a resist structure formed on the specimen during the analysis.

A method for reducing alteration of a specimen during analysis, comprising:

• creating a vacuum in a chamber in which the specimen is disposed during the analysis;
• and
• cooling a surface of an element disposed in the chamber to cause molecules in the chamber to be adsorbed onto the surface such that the molecules cannot cause reduction in a dimension of a resist structure formed on the specimen during the analysis.

A system configured to analyze a specimen, comprising:

• a scanning probe microscope configured to analyze the specimen while the specimen is disposed in an analysis chamber;
• and
• an element disposed within the analysis chamber, wherein a surface of the element is cooled such that molecules in the analysis chamber are adsorbed onto the surface and cannot cause reduction in a dimension of a resist structure formed on the specimen during the analysis.