Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained

Electron cyclotron resonance (ECR) plasma deposition process for single-wall carbon nanotubes (SWNTs) comprising the following steps:

• providing a catalyst-free substrate, which surface includes raised and/or lowered reliefs, in a deposition chamber;
• heating the substrate;
• injecting microwave power in the deposition chamber, the deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and at least one ECR area inside or at the border of said deposition chamber and facing said substrate, thereby causing dissociation and/or ionization of a gas containing carbon, at a pressure of less than 10−3 mbars, in said magnetic mirror at the center of the deposition chamber, thereby producing species that will be deposited on said heated substrate;
• and
• depositing SWNTs on the catalyst-free substrate.