Method for manufacturing a perpendicular magnetic recording head
AssigneeWestern Digital (Fremont), LLC
InventorsDanning Yang, Yingjian Chen, Brant Nease, Kyusik Sin
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Abstract
A method and system for manufacturing a perpendicular magnetic recording head is disclosed. The method and system include providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein and forming a perpendicular magnetic recording pole within the aperture. The CMP uniformity structure may include a CMP barrier layer. The method and system further include fabricating an insulator after formation of the perpendicular magnetic recording pole and performing a CMP to remove a portion of the insulator, expose a portion of the perpendicular magnetic recording pole and planarize an exposed surface of the perpendicular magnetic recording head.
Claims11
A method for manufacturing a perpendicular magnetic recording head comprising;
- providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein;
- forming a perpendicular magnetic recording pole within the aperture;
- fabricating an insulator after formation of the perpendicular magnetic recording pole;
- and
- performing a CMP to remove a portion of the insulator, exposing a portion of the perpendicular magnetic recording pole and planarizing an exposed surface of the perpendicular magnetic recording head.
A method for manufacturing a perpendicular magnetic recording head comprising;
- providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein, the CMP uniformity structure including an insulating CMP support structure and a CMP barrier layer on the CMP support structure;
- fabricating a seed layer;
- creating a pattern having a pole aperture therein, the pole aperture being above the aperture in the CMP uniformity structure;
- plating a perpendicular magnetic recording pole within the pole aperture, the perpendicular magnetic recording pole having a thickness;
- removing the pattern;
- forming an insulator after formation of the perpendicular magnetic recording pole;
- and
- performing a CMP to remove a portion of the insulator, exposing a portion of the perpendicular magnetic recording pole and planarizing an exposed surface of the perpendicular magnetic recording head, the CMP support structure allowing the exposed surface to have a deviation of less than the thickness of the perpendicular magnetic recording pole.
Dependencies are inferred from the claim text.