US 7,270,709 B2 · Method and apparatus of generating PDMAT precursor

Abstract

A precursor and method for filling a feature in a substrate. The method generally includes depositing a barrier layer, the barrier layer being formed from pentakis(dimethylamido)tantalum having less than about 5 ppm of impurities. The method additionally may include depositing a seed layer over the barrier layer and depositing a conductive layer over the seed layer. The precursor generally includes pentakis(dimethylamido)tantalum having less than about 5 ppm of impurities. The precursor is generated in a canister coupled to a heating element configured to reduce formation of impurities.

Claims20

Dependent claims

An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:

a canister having a sidewall, a top, and a bottom forming an interior volume;
an inlet port and an outlet port in fluid communication with the interior volume;
a plurality of baffles within the interior volume;
and
a heater coupled to the canister, wherein the plurality of baffles form an extended mean flow path between the inlet port and the outlet port.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

11/119,681Filed 2 May 2005 · continuation

Priority

17 Jul 2002

Published

US 2005/0189072 A11 Sep 2005

Granted

18 Sep 2007

Term ends

Not estimatedThe source records don’t support an estimate.

Classification12 codes

C23C 16/45544
Atomic layer deposition [ALD]: characterized by the apparatus
C23C 16/18
Characterised by the deposition of metallic material: from metallo-organic compounds
C23C 16/34
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides: nitrides
C23C 16/4402
Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber: reduction of impurities in the source gas

Family

Application10/198,727Parent of this continuation-in-part · filed 17 Jul 2002

Application10/447,255Parent of this continuation · filed 27 May 2003

US 2005/0189072 A1Pre-grant publication · published 1 Sep 2005

US 6,905,541 B2Parent of this continuation

US 7,186,385 B2Parent of this continuation-in-part

Application10/447,255Parent of this continuation-in-part

US 2004/0013577 A1Published application

US 2004/0014320 A1Published application

US 7,270,709 B2This patent

From the US filing history. Foreign family members aren’t listed.

Method and apparatus of generating PDMAT precursor

Life of this patent

Method and apparatus of generating PDMAT precursor

Life of this patent

Abstract

Claims20