Large area semiconductor detector with internal gain
AssigneeRadiation Monitoring Devices, Inc.
InventorsRichard Farrell, Kofi Vanderpuye
Life of this patent
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AssigneeRadiation Monitoring Devices, Inc.
InventorsRichard Farrell, Kofi Vanderpuye
Estimating the term…
A method is provided for forming a semiconductor-detection device that provides internal gain. The method includes forming a plurality of bottom trenches in a bottom surface of an n-doped semiconductor wafer; and forming a second plurality of top trenches in a top surface of the semiconductor wafer. The bottom surface and the top surface are opposed surfaces. Each of the bottom trenches is substantially parallel to and substantially juxtaposed to an associated one of the top trenches. The method further includes doping the semiconductor wafer with at least one p-type dopant to form a p-region that defines at least one n-well within the p-region, wherein a p-n junction is formed substantially at an interface of the n-well and the p-region; and removing a portion of the bottom surface to form a remaining-bottom surface, wherein a portion of the n-well forms a portion of the remaining-bottom surface.
A method of forming a semiconductor-detection device configured to detect photons and/or particles and provide internal gain from detected photons and/or a detected particle, the method comprising:
A photodiode comprising:
A photodiode comprising:
An avalanche photodiode array configured to detect incident electromagnetic radiation comprising:
An array of position sensitive APDs configured to detect incident electromagnetic radiation comprising:
Dependencies are inferred from the claim text.