Deposition of buffer layers on textured metal surfaces
AssigneeAmerican Superconductor Corporation
InventorsMartin W. Rupich, Urs-Detlev Schoop, Darren Verebelyi, Thomas Kodenkandath, Xiaoping Li
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Abstract
A method of making a multilayer article includes depositing a first material on the surface of a metal substrate to form a seed layer of the first material, the first material being deposited under reducing conditions relative to the metal substrate, and then epitaxially depositing a second material on a surface of the seed layer, wherein the second material is deposited from a solution-based precursor under second conditions that are more oxidizing than the reducing conditions used in the deposition of the first material.
Claims39
A method of making a multilayer article, comprising:
- depositing a first material on the surface of a metal substrate to form a biaxially textured seed layer of the first material, the first material being deposited under reducing conditions relative to the metal substrate;
- and
- epitaxially depositing a metal oxide over the seed layer wherein the metal oxide is deposited from a solution-based precursor to form a second layer under second conditions that are more oxidizing than the reducing conditions used in the deposition of the first material, and
- wherein the atmosphere of the second conditions comprises a water partial pressure in the range of about 4 torr to about 40 torr.
A method of making a multilayer article, comprising:
- depositing a first material on the surface of a metal substrate to form a biaxially textured seed layer of the first material, the first material being deposited under reducing conditions relative to the metal substrate;
- and
- epitaxially depositing a ceria layer having a termination plane over the seed layer, at least 25% of the termination plane of the ceria layer comprising the (001) plane,
- wherein the ceria layer is deposited from a solution-based precursor under second conditions that are more oxidizing than the reducing conditions used in the deposition of the first material, and
- wherein the atmosphere of the second conditions comprises a water partial pressure in the range of about 4 torr to about 40 torr.
Dependencies are inferred from the claim text.