Chemical mechanical polishing pad dresser
OwnerChien-Min Sunginventor
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Abstract
CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer, superabrasive grit held in the resin layer such that an exposed portion of each superabrasive grit protrudes from the resin layer, and a metal coating layer disposed between each superabrasive grit and the resin layer, where the exposed portions are substantially free of the metal coating layer. The metal coating layer acts to increase the retention of the superabrasive grit in the resin layer as compared to superabrasive grit absent the metal coating layer.
Claims53
A method of improving retention of superabrasive grit held in a solidified resin layer, comprising:
- disposing a metal coating layer between at least a portion of each superabrasive grit and the resin layer such that each superabrasive grit includes an exposed portion that protrudes at least partially from the resin layer, the exposed portion being substantially free of the metal coating layer.
A CMP pad dresser with improved superabrasive grit retention comprising:
- a resin layer;
- superabrasive grit held in the resin layer, each superabrasive grit including an exposed portion that protrudes at least partially from the resin layer;
- and
- a metal coating layer disposed between at least a portion of each superabrasive grit and the resin layer such that the exposed portion of each superabrasive grit is substantially free of the metal coating layer, the metal coating layer increasing retention of the superabrasive grit as compared to superabrasive grit absent the metal coating layer.
Dependencies are inferred from the claim text.