Method for reducing an equivalent resistance in an IC layout
AssigneeRealtek Semiconductor Corp.
InventorsJai-Ming Lin, Chao-Cheng Lee
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Abstract
A method of the invention is used for checking the via density between two adjacent layers of an IC layout. The method includes selecting a first metal layer and a second metal layer, wherein the first metal layer is adjacent to the second one, each of the metal layers has at least a wire, and the metal layers are coupled to each other through at least a first via; calculating the cross-sectional area of the first via and the overlapping area of the overlapped part of the wires in the first and the second metal layers; and disposing at least a second via in the overlapped part to couple the first and the second metal layers if the ratio of the cross-sectional area to the overlapping area is smaller than a predetermined ratio value.
Claims5
A method for reducing an equivalent resistance in an IC layout, the IC layout comprising a plurality of metal layers, the method comprising:
- checking the IC layout, comprising:
- determining a first metal layer among the metal layers, the first metal layer comprising at least a wire;
- determining a second metal layer among the metal layers, the second metal layer comprising at least a wire, at least a part of the wire of the second metal layer overlapping at least a part of the wire of the first metal layer and thereby an overlapped region being determined, the wire of the first metal layer conducting to the wire of the second metal layer through at least one via disposed in the overlapped region;
- calculating a ratio of the area of the via to the area of the overlapped region;
- and
- determining whether the ratio is smaller than a threshold value and thereby generating a checking result;
- and
- modifying the IC layout according to the checking result, comprising:
- disposing one or more extra vias in the overlapped region according to the checking result, so as to assist the conduction between the wire of the first metal layer and the wire of the second metal layer and thereby reduce the equivalent resistance between the first and second metal layers in the IC layout.
Dependencies are inferred from the claim text.