Technology migration for integrated circuits with radical design restrictions

A system for migrating an integrated circuit (IC) design layout from a source technology without radical design restrictions (RDR) to a target technology with RDR, the system comprising:

• means for inserting a designator shape within the design layout prior to migration to reserve space for a feature;
• means for migrating the design layout from the source technology without RDR to the target technology with RDR while reserving space for the feature according to the designator shape, wherein the migrating means includes means for legalizing the design layout to meet an RDR grid constraint and fix any ground rule violation in a first direction;
• means for inserting required dummy shapes;
• and means for running a minimum perturbation analysis in order to address an edge coverage requirement of at least one critical shape and fix any ground rule violation in a second direction;
• and
• wherein the designator shape includes instructions for the migrating meas about how the designator shape changes the design layout adjacent to the designator shape, and wherein the instructions include at least one instruction regarding splitting a diffusion, adding space between features, and an amount of space to be reserved for the feature.

A computer program product comprising a computer useable medium having computer readable program code embodied therein for migrating an integrated circuit (IC) design layout from a source technology without radical design restrictions (RDR) to a target technology with RDR, the program product comprising:

• program code configured to insert a designator shape within the design layout prior to migration to reserve space for a feature;
• program code configured to migrate the design layout from the source technology without RDR to the target technology with RDR while reserving space for the feature according to the designator shape, wherein the migrating program code includes program code to legalize the design layout to meet an RDR grid constraint and fix any ground rule violation in a first direction;
• program code to insert required dummy shapes;
• and program code to run a minimum perturbation analysis in order to address an edge coverage requirement of at least one critical shape and fix any ground rule violation in a second direction;
• and
• wherein the designator shape includes instructions for the migrating code about how the designator shape changes the design layout adjacent to the designator shape, and wherein the instructions include at least one instruction regarding splitting a diffusion, adding space between features, and an amount of space to be reserved for the feature.

A method for migrating an integrated circuit (IC) design layout from a source technology without radical design restrictions (RDR) to a target technology with RDR, the method comprising the steps of:

• prioritizing a first direction and a second direction for compaction into a primary compaction direction based on which of the first and second directions has less tolerant ground rules and a secondary compaction direction based on the direction having more tolerant ground rules;
• and
• migrating the design layout from the source technology without RDR to the target technology with RDR in the primary compaction direction using the less tolerant ground rules, wherein the migrating includes legalizing the design layout to meet an RDR grid constraint and fix any ground rule violation in the primary compaction direction;
• inserting required dummy shapes;
• and running a minimum perturbation analysis in order to address an edge coverage requirement of at least one critical shape and fix any ground rule violation in a secondary compaction direction.

A system for migrating an integrated circuit (IC) design layout from a source technology without radical design restrictions (RDR) to a target technology with RDR, the method comprising the steps of:

• means for prioritizing a first direction and a second direction for compaction into a primary compaction direction based on which of the first and second directions has less tolerant ground rules and a secondary compaction direction based on the direction having more tolerant ground rules;
• and
• means for migrating the design layout from the source technology without RDR to the target technology with RDR in the primary compaction direction, wherein the migrating means includes means for legalizing the design layout to meet an RDR grid constraint and fix any ground rule violation in the primary compaction direction;
• means for inserting required dummy shapes;
• and means for running a minimum perturbation analysis in order to address an edge coverage requirement of at least one critical shape and fix any ground rule violation in a secondary compaction direction.

A computer program product comprising a computer useable medium having computer readable program code embodied therein for migrating an integrated circuit (IC) design layout from a source technology without radical design restrictions (RDR) to a target technology with RDR, the program product comprising:

• program code configured to prioritize a first direction and a second direction for compaction into a primary compaction direction based on which of the first and second directions has less tolerant ground rules and a secondary compaction direction based on the direction having more tolerant ground rules;
• and
• program code configured to migrate the design layout from the source technology without RDR to the target technology with RDR in the primary compaction direction, wherein the migrating program code includes program code to legalize the design layout to meet an RDR grid constraint and fix any ground rule violation in the primary compaction direction;
• program code to insert required dummy shapes;
• and program code to run a minimum perturbation analysis in order to address an edge coverage requirement of at least one critical shape and fix any ground rule violation in a secondary compaction direction.