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US 7,256,872 B2Granted
Purging gas from a photolithography enclosure between a mask protective device and a patterned mask
AssigneeIntel Corporation
InventorsHan-Ming Wu, Ronald J. Kuse
Life of this patent
Estimating the term…
Abstract
A method and apparatus are described for removing an initial gas from a gas-filled enclosure between the mask-protective device, such as a pellicle, and the patterned mask, such as a reticle, and adding a purge gas with a different composition. The gas-filled enclosure includes a vent for adding the purge gas to the chamber and removing the initial gas from the chamber. Adding and removing may be accomplished by using pressure, diffusion, vacuum, or other means.
Claims17
A method comprising:
- adding a first gas to an enclosure having a second gas through an inlet port having a plurality of discrete openings arranged to distribute a flow of the first gas over a length of a side of the enclosure, the first gas having a different composition than the second gas, the enclosure being between a mask protective device, a patterned mask, and walls connecting the mask protective device with the patterned mask, wherein the openings are in the walls connecting the mask protective device with the patterned mask;
- and
- removing at least a portion of the second gas from the enclosure through one or more outlet ports.
A method comprising:
- adding a first gas to an enclosure having a second gas through an inlet port having a shape to distribute a flow of the first gas over a length of a side of the enclosure, the first gas having a different composition then the second gas, the enclosure being between a mask protective device, a patterned mask, and wails connecting the mask protective device with the patterned mask;
- removing at least a portion of the second gas from the enclosure through one or more outlet ports,
- wherein said adding and said removing comprise adding the first gas by diffusion and removing the second gas by diffusion;
- and
- heating a gas in the enclosure to increase a diffusion coefficient.
2 more elements
A method comprising:
- adding a first gas to an enclosure including a second gas through a vent including a plurality of openings to distribute a flow of the first gas over a length of a side of the enclosure, the first gas having less total oxygen and carbon than the second gas, the enclosure being between a pellicle, a mask, and walls connecting the pellicle with the mask, wherein said adding comprises adding the first gas through a slit in a wall;
- and
- removing at least a portion of the second gas from the enclosure.
A method comprising:
- adding a first gas to an enclosure including a second gas through a vent including a plurality of openings to distribute a flow of the first gas over a length of aside of the enclosure, the first gas having less total oxygen and carbon than the second gas, the enclosure being between a pellicle, a mask, and walls connecting the pellicle with the mask, wherein said openings are in a wall;
- and
- removing at least a portion of the second gas from the enclosure.
Dependencies are inferred from the claim text.