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US 7,256,812 B2Granted
Laser exposing apparatus
AssigneeCanon Kabushiki Kaisha
InventorHajime Motoyama
Life of this patent
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Abstract
A laser exposing apparatus has a first laser source emitting a first laser beam, a second laser source emitting a second laser beam shorter in wavelength than the first laser beam, and an optical device for directing the first laser beam and the second laser beam to a photosensitive member. The second laser beam has a longer optical path length to the photosensitive member than the first laser beam.
Claims10
A laser exposing apparatus comprising:
- a first laser source emitting a first laser beam;
- a second laser source emitting a second laser beam;
- optical means for directing the first laser beam and the second laser beam to a photosensitive member;
- and
- adjusting means for being capable of adjusting a length of an optical path from the first laser beam to the photosensitive member and a length of an optical path from the second laser beam to the photosensitive member, which are different from each other, so that the short and long correlation between both paths is inverted.
2 more elements
A laser exposing apparatus, comprising:
- a first laser source emitting a first laser beam;
- a second laser source emitting a second laser beam;
- optical means for directing the first laser beam to a photosensitive member along a first optical path and for directing the second laser beam to the photosensitive member along a second optical path, wherein the first optical path and the second optical path have a length relationship in which the first optical path is longer than the second optical path;
- and
- adjusting means for inverting the length relationship such that the second optical path is longer than the first optical pat.
2 more elements
Dependencies are inferred from the claim text.