Method for testing pixels for LCD TFT displays
AssigneeApplied Materials, Inc.
InventorsAxel Wenzel, Ralf Schmid, Matthias Brunner
Life of this patent
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Abstract
The present invention provides a method of electron beam testing of liquid crystal displays comprising non-uniform electrodes having a conductive portion and a dielectric portion. In accordance with methods of the present invention, the diameter of the electron beam is increased so that the beam is less focused, i.e., enlarged or “blurred,” over a non-uniform electrode area. The diameter of the beam is increased so that the beam generates secondary electrons from the conductive portion of the non-uniform electrode area. The configured test beam may be circular, elliptical, or other suitable shapes.
Claims21
A method for conducting electron beam testing of TFT devices on a flat panel display substrate comprising non-uniform electrode areas, each non-uniform electrode area having a conductive portion and a dielectric portion, the method comprising:
- generating an enlarged electron test beam having an area that is sufficient to cover at least partially the dielectric portion and at least partially the conductive portion;
- and
- directing the enlarged electron test beam onto the non-uniform electrode area, wherein the area of the enlarged electron test beam is at least about 50% of the non-uniform electrode area.
A method for conducting electron beam testing of TFT devices on a flat panel display substrate comprising non-uniform electrode areas, each non-uniform electrode area having dielectric lines formed over a conductive portion, the method comprising:
- generating an electron test beam having an increased area including a diameter that is sufficient to cover at least partially one of the dielectric lines and to cover at least partially the conductive portion;
- and
- directing the electron test beam onto the non-uniform electrode areas of the flat panel display substrate, wherein the diameter of the electron beam is between about two times and about ten times a width of one of the dielectric lines.
A method for conducting electron beam testing of TFT devices on a flat panel display substrate comprising non-uniform electrodes areas, each non-uniform electrode area comprising a first electrode and a second electrode separated by a dielectric portion, the method comprising:
- generating an enlarged electron test beam to have an area having a diameter that is sufficient to cover at least partially the first electrode, at least partially the second electrode, and at least partially the dielectric portion;
- and
- directing the enlarged electron test beam onto the non-uniform electrode areas of the flat panel display substrate, wherein the diameter of the enlarged electron beam is between about two times and about ten times a width of one of the dielectric lines.
A method for conducting electron beam testing of TFT devices on a flat panel display substrate comprising non-uniform electrodes areas, each non-uniform electrode area comprising a first electrode and a second electrode separated by a dielectric portion, the method comprising:
- directing an electron test beam onto the flat panel display substrate;
- blurring the electron test beam to have an area having a diameter that is sufficient to cover at least partially the first electrode, at least partially the second electrode, and at least partially the dielectric portion;
- and
- directing the electron test beam onto the non-uniform electrode areas of the flat panel display substrate, wherein the diameter of the electron beam is between about two times and about ten times a width of one of the dielectric lines.
Dependencies are inferred from the claim text.