Composition for forming organic insulating film and organic insulating film formed from the same

A composition for forming an organic insulating film, comprising:

• (i) an organic insulating polymer represented by Formula 1 or 2 below:
• wherein substituents R′ are each independently a hydrogen atom, a hydroxyl group, an ester group, an amide group, a C1˜12 alkyl or alkoxy group, a C6˜30 aromatic group, or a C3˜30 heteroaromatic group, and the aromatic or heteroaromatic group may be substituted with at least one group selected from hydroxyl, ester, amide, C1˜12 alkyl and alkoxy, and amine groups;
• n is a real number between 0.1 and 1;
• m is a real number between 0 and 0.9;
• and the sum of n and m is 1, or
• wherein R is a C6˜30 aromatic or C3˜30 heteroaromatic group, and the aromatic group and the heteroaromatic group may be substituted with at least one group selected from C1˜12 alkyl and alkoxy, and amine groups;
• substituents R″ are each independently a hydrogen atom, a hydroxyl group, an ester group, an amide group, a C1˜12 alkyl or alkoxy group, a C6˜30 aromatic group or a C3˜30 heteroaromatic group, and the aromatic group and the heteroaromatic group may be substituted with at least one group selected from hydroxyl, ester, amide, C1˜12 alkyl and alkoxy, and amine groups, with the proviso that at least one R″ is a hydroxyl group;
• n is a real number between 0.1 and 0.9;
• m is a real number between 0.1 and 0.9;
• and the sum of n and mis 1;
• (ii) a crosslinking agent;
• (iii) a photoacid generator;
• and
• (iv) a solvent.