Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method

A sample repairing method, comprising the steps of:

• (a) irradiating a sample having at least one pattern with an electron beam emitted from an electron gun through an objective lens;
• (b) obtaining an image of said sample surface;
• (c) searching for a region to be repaired on said sample from said image of said sample surface and scanning said region to be repaired by the electron beam;
• (d) increasing a pressure of a reactive gas in said region on said sample subject to the scanning with the electron beam;
• (e) shaping the electron beam by a shaping aperture plate, said shaping aperture plate having a first shaping aperture a side of which is angled at a predetermined degree proximal to an angle of a side of said pattern formed on the sample;
• (f) selectively scanning said pattern so as to repair said pattern by etching or apply deposition;
• and
• (g) confirming the completion of said repairing of said sample, wherein a small aperture for limiting the pressure is disposed between said sample and said objective lens.

A sample repairing apparatus for repairing a sample, comprising:

• an electron gun for emitting an electron beam;
• an objective lens for focusing the electron beam to irradiate a sample having at least one pattern;
• a shaping aperture plate for shaping the electron beam, said shaping aperture plate having a first shaping aperture a side of which is angled at a predetermined degree proximal to an angle of a side of said pattern formed on the sample;
• a gas supply for supplying a reactive gas onto a surface of said sample irradiated with the electron beam;
• and
• a differential exhaust system disposed in said objective lens and operative to keep exhausting the reactive gas so as to inhibit the reactive gas supplied onto said surface irradiated with the electron beam by said gas supply from flowing toward an electron gun side, wherein
• said pattern to be repaired on said sample is selectively scanned with the electron beam so as to repair said pattern by etching or applying deposition.

A sample repairing method, comprising:

• (a) irradiating a sample having at least one pattern with an electron beam focused by an objective lens;
• (b) supplying a reactive gas onto a surface of said sample irradiated with the electron beam;
• (c) shaping the electron beam by a shaping aperture plate, said shaping aperture plate having a first shaping aperture a side of which is angled at a predetermined degree proximal to an angle of a side of said pattern formed on the sample;
• and
• (d) selectively scanning said pattern with the electron beam so as to repair said pattern by etching or apply deposition.