Manufacturing method of liquid crystal display device

A method for manufacturing a liquid crystal display device comprising:

• forming a gate electrode over a substrate;
• consecutively forming a gate insulating layer and an active layer over the gate electrode;
• depositing a photoresist over the active layer and performing a photolithography process to form a first photoresist pattern, and then removing the active layer formed at a source/drain region;
• ashing the first photoresist pattern to expose a part of an active region;
• forming a source/drain electrode at the source/drain region;
• forming a passivation layer on the substrate including the source/drain electrode;
• forming a second photoresist pattern that exposes a pixel region on the passivation layer;
• forming a pixel region by using the second photoresist pattern as a mask;
• side-etching a part of the passivation layer thus to expose a part of the drain electrode;
• forming a pixel electrode material over the second photoresist pattern and the pixel region;
• and
• simultaneously removing the second photoresist pattern and the pixel electrode material formed thereon to form a pixel electrode.