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US 7,255,981 B2Granted
Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus
AssigneeSeiko Epson Corporation
InventorsToshihiro Otake, Mutsumi Matsuo, Tadashi Tsuyuki
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Abstract
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.
Claims20
A method for manufacturing a light reflective film comprising the steps of:
- forming a first base including a plurality of concave portions or convex portions by performing a first exposure process on a first photosensitive resin using a first mask having a striped-shaped pattern of light transmissive or non-transmissive portions in a row direction or in a column direction that is repeated over a plurality of lines, a plurality of the light transmissive and the non-transmissive portions being randomly arranged in a plane direction in 100 to 2,000 dot units;
- forming a second base having a plurality of continuous concave portions and convex portions by depositing a second photosensitive resin on the first base and subsequently performing a second exposure process on the second photosensitive resin;
- and
- forming a reflective layer on the second base.
1 more element
Dependencies are inferred from the claim text.