Back to results
US 7,255,971 B2Granted
Positive resist composition
AssigneeFUJIFILM Corporation
InventorsToru Fujimori, Yasumasa Kawabe
Life of this patent
Estimating the term…
Abstract
A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.
Claims11
A positive resist composition comprising the components of:
- (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation;
- (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid;
- (C) a basic compound;
- (D) a non-polymeric compound comprising at least three alcoholic hydroxyl groups or at least three substituted alcoholic hydroxyl groups, comprising at least one cyclic structure, and comprising at least one ethereal oxygen-containing tetrahydrofuran or tetrahydropyran ring, and
- (E) a surfactant comprising at least one of a fluorine atom and a silicon atom,
- wherein the component (B) is a resin comprising an alicyclic hydrocarbon group that is monocyclic or polycyclic or a resin having a structure wherein at least one fluorine atom is substituted in at least one of a main chain and a side chain of a polymer, and being capable of decomposing by an action of an acid to increase in solubility in an alkaline developer;
- and
- the component (D) does not contain a phenolic hydroxyl group or a substituted phenolic hydroxyl group.
5 more elements
Dependencies are inferred from the claim text.