Anodic bonding structure, fabricating method thereof, and method of manufacturing optical scanner using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsYoung-chul Ko, Jin-ho Lee, Chang-soo Lee
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AssigneeSamsung Electronics Co., Ltd.
InventorsYoung-chul Ko, Jin-ho Lee, Chang-soo Lee
Estimating the term…
Provided are an anodic bonding structure, a fabricating method thereof, and a method of manufacturing an optical scanner using the same. Provided anodic bonding structure having a substrate and a glass substrate arranged above the substrate, includes at least one dielectric and at least one metal layer deposited between the substrate and the glass substrate, with a dielectric arranged uppermost, wherein the uppermost dielectric and the glass substrate are anodic bonded. Provided method of fabricating an anodic bonding structure having a substrate and a glass substrate arranged above the substrate, includes an act of depositing at least one dielectric and at least one metal layer between the substrate and the glass substrate, with dielectric arranged uppermost, and an act of anodic bonding the uppermost dielectric with the glass substrate. In the provided structure of depositing the metal layer and the dielectric between the substrate and the glass substrate, the dielectric and the glass substrate or the dielectric and the metal layer are anodic bonded so that a stable performance is attained to manufacture various micro-electromechanical systems (MEMS) devices.
A method of fabricating an anodic, bonding structure including a substrate, and a glass substrate arranged above the substrate, the method comprising:
A method of fabricating an anodic bonding structure including a substrate and a glass substrate arranged above the substrate, the method comprising:
Dependencies are inferred from the claim text.