Polishing assembly with a window
AssigneeApplied Materials, Inc.
InventorsManoocher Birang, Allan Gleason, William L. Guthrie
Life of this patent
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Abstract
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
Claims15
A polishing assembly for a chemical mechanical polishing apparatus, comprising:
- a platen;
- a polishing pad with a polishing surface supported on the platen, the polishing pad having an aperture therethrough;
- and
- a solid, substantially transparent window spanning the aperture, wherein a portion of the polishing pad extends laterally over a portion of the window.
Dependencies are inferred from the claim text.