Systems and methods for metrology recipe and model generation
AssigneeTokyo Electron Limited
InventorTalat Fatima Hasan
Life of this patent
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Abstract
Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
Claims14
A method of evaluating parameters of a semiconductor wafer as part of a manufacturing process comprising the steps of:
- measuring a plurality of reference wafers with an off-line scatterometer;
- determining the parameters of the reference wafers based on the measurements;
- using a model and the results of the determining step, to generate a library of calculated signatures, each corresponding to a different parameter set;
- measuring a test wafer with a integrated scatterometer, said integrated scatterometer being integrated with a process tool;
- and
- comparing the results of the measurement of the test wafer to the library of signatures to evaluate the parameters of the test wafer.
A lithograph track processing apparatus comprising:
- a stand-alone scatterometer, said scatterometer for measuring reference wafers and based on the measurements generating information corresponding to one of a measurement recipe and a library of signatures corresponding to parameter sets;
- and
- a scatterometer integrated with a lithographic track processing tool, said integrated scatterometer for measuring a test wafer and evaluating process parameters of the test wafer using the measurement of the test wafer and said information received from the stand-alone tool.
A lithograph track processing apparatus comprising:
- a stand-alone scatterometer, said scatterometer for measuring reference wafers and using the measurements and a model, to generate a library of calculated signatures each corresponding to a different parameter set;
- and
- a scatterometer integrated with a lithographic track processing tool, said integrated scatterometer for measuring a test wafer and evaluating process parameters of test wafer based on the measurement of the test wafer and the library received from the stand-alone scatterometer.
Dependencies are inferred from the claim text.