Metrology system with spectroscopic ellipsometer and photoacoustic measurements
AssigneeRudolph Technologies, Inc.
InventorsRobert Gregory Wolf, Christopher Morath, Robin Mair
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Abstract
A photoacoustic system with ellipsometer, where the ellipsometer includes a laser light source for generating an incident beam, an element for focusing the incident beam on a sample, a unit for measuring the change in amplitude of the incident beam on reflection and a unit for measuring the phase difference of the incident beam on reflection. The system further includes an element to convert an input narrow spectrum beam generated by the laser light source to a broadband sample measurement beam that is focused onto the sample.
Claims38
A photoacoustic system with ellipsometer, said ellipsometer comprising a laser light source for generating an incident beam, means for focusing said incident beam on a sample, means for measuring the change in amplitude of said incident beam on reflection and means for measuring the phase difference of said incident beam on reflection, further comprising means for converting an input narrow spectrum beam generated by said laser light source to a broadband sample measurement beam that is focused onto the sample, where a measurement is made on a film of the sample using said ellipsometer, and where a result of the measurement is used to adjust a parameter of said photoacoustic system.
A photoacoustic system with ellipsometer, said ellipsometer comprising a laser light source for generating an incident beam, means for focusing said incident beam on a sample, means for measuring the change in amplitude of said incident beam on reflection and means for measuring the phase difference of said incident beam on reflection, further comprising means for converting an input narrow spectrum beam generated by said laser light source to a broadband sample measurement beam that is focused onto the sample, where a measurement is made on a film of the sample using said photoacoustic system, and where a result of the measurement is used to adjust a parameter of said ellipsometer.
A photoacoustic system with ellipsometer, said ellipsometer comprising a laser light source for generating an incident beam, means for focusing said incident beam on a sample, means for measuring the change in amplitude of said incident beam on reflection and means for measuring the phase difference of said incident beam on reflection, further comprising means for converting an input narrow spectrum beam generated by said laser light source to a broadband sample measurement beam that is focused onto the sample, where a measurement is made on a film of the sample using said ellipsometer, and where a result if the measurement is used to determine an optical constant of the film used for calculating a thickness of the film using said photoacoustic system.
A photoacoustic system with ellipsometer, said ellipsometer comprising a laser light source for generating an incident beam, an element to focus said incident beam on a sample, a unit to measure a change in amplitude of said incident beam on reflection and a unit to measure a phase difference of said incident beam on reflection, further comprising a converter to convert an input narrow spectrum beam generated by said laser light source to a broadband sample measurement beam that is focused onto the sample, where a measurement is made on a film of the sample using one of said ellipsometer and said photoacoustic system, and where a result of the measurement is used to adjust a parameter of the other one of the ellipsometer and photoacoustic system not used to make the measurement.
A photoacoustic system with ellipsometer, said ellipsometer comprising a laser light source for generating an incident beam, an element to focus said incident beam on a sample, a unit to measure a change in amplitude of said incident beam on reflection and a unit to measure a phase difference of said incident beam on reflection, further comprising a converter to convert an input narrow spectrum beam generated by said laser light source to a broadband sample measurement beam that is focused onto the sample, where a measurement is made on a film of the sample using said ellipsometer, and where a result of the measurement is used to determine an optical constant of the film used for calculating a thickness of the film using said photoacoustic system.
Dependencies are inferred from the claim text.