Semiconductor integrated circuit device and manufacturing method thereof

A semiconductor integrated circuit device comprising:

• a first conductive type region and a second conductive type region formed in semiconductor substrate and separated by an isolation region;
• a gate insulator formed on said first conductive type region and said second conductive type region;
• a second conductive type silicon layer which is deposited over said first conductive type region and on said gate isolator, and a first conductive type silicon layer which is disposed over said second conductive type region and on said gate insulator, wherein a boundary between said first conductive type silicon layer and said second conductive type silicon layer is located over said isolation region;
• a first nitride film of refractory metal formed on said first conductive type silicon layer, and a second nitride film of refractory metal formed on said second conductive type silicon layer;
• a first refractory metal film formed on said first nitride film of refractory metal, and a second refractory metal film formed on said second nitride film of refractory metal;
• and
• a metal carbide formed between said first nitride film or refractory metal and said second nitride film of refractory metal, between said first refractory metal film and said second refractory metal film, and on said boundary between said first conductive type silicon layer and said second conductive type silicon layer.