Method and apparatus for forming optical elements by inducing changes in the index of refraction by utilizing electron beam radiation

A method for forming an optical element comprising the steps of:

• positioning an optical material layer in a near vacuum, said optical material layer having a first index of refraction;
• exposing said optical material layer with a large area electron beam;
• and
• controlling the energy of the electron beam to raise the index of refraction of a first sub-layer of said optical material to a second index of refraction, said second index of refraction higher than said first index of refraction, to form an optical element from said first sub-layer of said optical material with a higher second index of refraction and the remaining second sub-layer of said optical material with the first index of refraction.

A method for forming a binary diffractive optical element comprising the steps of:

• positioning an optical material layer in a near vacuum, said optical material layer having a first index of refraction;
• exposing said optical material layer with a large area electron beam;
• and
• controlling the energy of the electron beam to alter the index of refraction of multiple sub-layers of said optical material layer to form a multiple level diffractive structure within said optical material layer.

A method for forming an optical element comprising the steps of:

• positioning an optical material in a near vacuum, said optical material having a first index of refraction;
• exposing said optical material with a large area electron beam;
• and
• controlling the energy of the electron beam to raise the index of refraction of at least one first area of said optical material to a second index of refraction, said second index of refraction higher than said first index of refraction, to form an optical element from said at least one first area of said optical material with a higher second index of refraction and the remaining at least one second area of said optical material with the first index of refraction.

A method for forming an optical element comprising the steps of:

• positioning an optical material layer in a near vacuum, said optical material layer having a first index of refraction;
• positioning an embossed structure on said optical material layer;
• exposing said optical material layer through said embossed structure with a large area electron beam;
• and
• controlling the energy of the electron beam to raise the index of refraction of a first area of said optical material to a second index of refraction, said second index of refraction higher than said first index of refraction, to form an optical element from said first area of said optical material with a higher second index of refraction and the remaining second area of said optical material with the first index of refraction.

A method for forming a waveguide comprising the steps of:

• positioning an optical material layer in a near vacuum, said optical material layer having a first index of refraction, said optical material layer having a first surface and a second surface, said second surface being opposite said first surface;
• positioning a first embossed structure on said first surface of said optical material layer;
• positioning a second embossed structure on said second surface of said optical material layer;
• exposing said optical material layer through said first embossed structure with a first large area electron beam;
• exposing said optical material layer through said second embossed structure with a second large area electron beam;
• controlling the energy of said first electron beam to raise the index of refraction of a first area of said optical material to a second index of refraction, said second index of refraction higher than said first index of refraction;
• and
• controlling the energy of said second electron beam to raise the index of refraction of a second area of said optical material to a third index of refraction, said third index of refraction higher than said first index of refraction, said first area and said second area overlapping in said optical material layer to form a core layer for said waveguide, said first area and said second area and said optical material layer forming a cladding layer for said waveguide, said cladding layer surrounding said core layer.

A method for forming an optical fiber comprising the steps of:

• positioning a cylindrical strand of optical material having a first index of refraction in a near vacuum;
• exposing said cylindrical strand of optical material with a large area electron beam;
• controlling the energy of the electron beam to raise the index of refraction of a first cladding layer to a second index of refraction, said second index of refraction higher than said first index of refraction;
• and
• controlling the energy of the electron beam to raise the index of refraction of a second core layer to a third index of refraction, said third index of refraction higher than said first index of refraction, said third index of refraction higher than said second index of refraction, said first cladding layer surrounding said second core layer, said core layer and said cladding layer forming a waveguide.