Molding technique for fabrication of optoelectronic devices

A method for making an exciton-splitting and charge transporting network, the method comprising:

• forming a porous nano-architected template film on a substrate, wherein the porous nano-architected film includes interconnected pores that are substantially uniformly distributed and wherein interconnections of pores are found within the film, wherein the pores have diameters of between about 1 nm and about 100 nm, wherein neighboring pores are separated by between about 1 nm and about 100 nm, wherein the interconnected pores in the porous nano-architected film are accessible from an underlying layer and/or overlying layer;
• substantially filling the pores in the porous nano-architected template film with a pore-filling material;
• removing the porous template film while leaving behind the pore-filling material that substantially filled the interconnected pores of the film, thereby forming a nanoscale grid network comprising interconnected structures of the pore-filling material that are distributed in a substantially uniform fashion with neighboring structures separated by a distance of between about 1 nm and about 100 nm, wherein the structures have diameters of between about 1 nm and about 100 nm;
• and
• incorporating a network-filling material into the nanoscale grid network, whereby the network-filling material substantially fills the spaces between the structures in the nanoscale grid network,
• wherein the nanoscale grid network and the network-filling material have complementary charge-transfer properties with respect to each other so that an exciton-splitting and charge transporting network is obtained.