Nitrogen-containing organic compound, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakeru Watanabe, Takeshi Kinsho, Katsuya Takemura, Akihiro Seki
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Abstract
Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.
Claims6
A nitrogen-containing organic compound selected from the group consisting of the following formulae:
A positive-working chemically amplified resist composition comprising:
- (A) a nitrogen-containing organic compound having the general formula (1)
- wherein R1 is hydrogen, methyl, ethyl or phenyl, R2 is a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms, and n is an integer of 1 to 6;
- (B) an organic solvent;
- (C) a base resin having an acid labile group-protected acidic functional group which is alkali-insoluble or substantially alkali-insoluble, but becomes alkali-soluble when the acid labile group is eliminated;
- and
- (D) a photoacid generator.
A negative-working chemically amplified resist composition comprising:
- (A) a nitrogen-containing organic compound having the general formula (1)
- wherein R1 is hydrogen, methyl, ethyl or phenyl, R2 is a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms, and n is an integer of 1 to 6;
- (B) an organic solvent;
- (C′) a base resin which is alkali-soluble, but becomes substantially alkali-insoluble when crosslinked with a crosslinking agent;
- (D) a photoacid generator;
- and
- (E) a crosslinking agent which induces crosslinkage under the action of an acid.
A nitrogen-containing organic compound having the general formula (1):
- wherein R1 is hydrogen, methyl, ethyl or phenyl, R2 is a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms, and n is 2, 3, 4, 5 or 6.
A chemically amplified resist composition comprising at least one nitrogen-containing organic compound having the general formula (1):
- wherein R1 is hydrogen, methyl, ethyl or phenyl, R2 is a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms, and n is 2, 3, 4, 5 or 6.
Dependencies are inferred from the claim text.