Electroconductive oxide sintered compact, sputtering target comprising the sintered compact and methods for producing them
AssigneeNippon Mining & Metals Co., Ltd.
InventorRyo Suzuki
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Abstract
A SrRuO3 conductive oxide sintered body characterized in that the relative density is 93% or more. By improving the additive amount and sintering conditions of Bi2O3, the present invention seeks to improve the relative density of a SrRuO3 conductive oxide sintered body, and to provide a conductive oxide sintered body capable of suppressing the generation of particles during sputtering upon forming a thin film and improving the quality and production yield; a sputtering target formed from such sintered body; and the manufacturing method thereof.
Claims12
A sintered body, comprising a SrRuO3 conductive oxide sintered body containing an amount greater than 0.5 mol % and no greater than 1.2 mol % of Bi2O3 and having a relative density of 93% or more.
A sputtering target, comprising a SrRuO3 conductive oxide sintered body containing an amount greater than 0.5 mol % and no greater than 1.2 mol % of Bi2O3 and having a relative density of 93% or more.
A manufacturing method of a SrRuO3 conductive oxide sintered body or a sputtering target formed from said sintered body, comprising the step of adding an amount greater than 0.5 mol % and no greater than 1.2 mol % of Bi2O3 as a sintering auxiliary upon manufacturing the SrRuO3 conductive oxide sintered body.
Dependencies are inferred from the claim text.