Optimized grooving structure for a CMP polishing pad

A polishing pad consisting of a polymer sheet for chemical mechanical polishing, comprising a body rotatable in a predetermined direction and having a working surface, said working surface being provided with grooves, said grooves being formed so as to be subdivided in a plurality of zones, said grooves within each of said zones being formed as substantially concentric grooves, so as to provide together a tortoise-shell shaped form.

A polishing pad consisting of a polymer sheet for chemical mechanical polishing, comprising a body rotatable in a predetermined direction and having a working surface, said working surface being provided with grooves, said grooves being formed so as to be subdivided in a plurality of zones, said grooves within each of said zones having a similar shape to other grooves within the same zone, and said grooves within each of said zones being configured to form a tortoise-shell pattern of grooves on said polishing pad.

A polishing pad comprising grooves and groups of grooves;

• wherein a plurality of said grooves are positioned in a first group, and wherein each of said plurality of grooves in said first group has a shape that is similar to the rest of said plurality of grooves in said first group, and wherein each of said plurality of grooves in said first group has a common center with the rest of said plurality of grooves in said first group;
• and
• wherein said polishing pad further comprises a plurality of groups, at least some of which are similar to said first group, wherein at least one group of said plurality of groups is adjacent to another group of said plurality of groups, and wherein each group of said plurality of groups has a separate common center.