Apparatus for inspection of a wafer
AssigneeVistec Semiconductor Systems GmbH
InventorsAlbert Kreh, Henning Backhauss
Life of this patent
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Abstract
The invention concerns an apparatus for inspection of a wafer, encompassing at least one incident-light illumination device that radiates an illuminating light beam which is incident obliquely onto a surface of a wafer to be inspected, and an image capture device for capturing an image of the surface in a dark-field arrangement. The wafer inspection apparatus is characterized in that at least one deflection device is provided in order to deflect an associated illuminating light beam onto the surface of the wafer.
Claims27
An apparatus for inspection of a wafer, comprising:
- at least one incident-light illumination device arranged above a separation panel, wherein the separation panel is positioned between the wafer and the incident-light illumination device, wherein the at least one incident-light illumination device radiates an illuminating light beam through at least one opening in the separation panel onto a surface of the wafer to be inspected,
- at least one deflection device that is arranged below the separation panel in order to deflect the illuminating light beam onto the surface of the wafer, wherein the illuminating light beam is incident obliquely to the surface of the wafer;
- and
- an image capture device to capture an image of the surface in a dark-field arrangement, wherein the image capture device is arranged above the separation panel.
An apparatus for inspection of a wafer, comprising:
- at least one incident-light illumination device;
- an image capture device to capture an image of a surface of the wafer in a dark-field arrangement,
- a separation panel arranged between the wafer and the at least one incident-light illumination device and between the wafer and image capture device, wherein at least one opening is formed in the separation panel,
- at least one deflection device that is arranged with respect to the opening in order to deflect illuminating light beam onto the surface of the wafer.
Dependencies are inferred from the claim text.