Back to results
US 7,248,335 B2Granted
Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
AssigneeCanon Kabushiki Kaisha
InventorKazuyuki Kasumi
Life of this patent
Estimating the term…
Abstract
An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.
Claims2
An apparatus for transferring a pattern of a master to a substrate, said apparatus comprising:
- a frame;
- a master stage arranged on said frame and configured to hold the master;
- a substrate stage configured to hold the substrate and to be moved relative to said frame;
- a first alignment scope arranged on said substrate stage and configured to measure a position of a master alignment mark formed on the master;
- a reference mark integrated with said first alignment scope;
- and
- a second alignment scope arranged on said frame and configured to measure a position of a substrate alignment mark formed on the substrate and a position of the reference mark,
- wherein a base line of said second alignment scope is obtained from measuring a position of the reference mark, moved with said substrate stage, by said second alignment scope and measuring a position of the master alignment mark by said first alignment scope moved with said substrate stage.
5 more elements
Dependencies are inferred from the claim text.