Method of making active matrix display

A method of making an active matrix display, comprising:

• providing a plurality of parallel first conductors upon a substrate;
• depositing a gate dielectric upon the first conductor;
• providing a plurality of parallel second conductors and pixel electrodes upon the gate dielectric, the second conductors crossing the first conductors, each pixel electrode paired to a second conductor, each pairing defining a narrow gap between the paired second conductor and pixel electrode, each pairing further defining large surface areas between unpaired pixel elements and second conductors;
• depositing a semiconductor material over the paired second conductors, pixel electrodes and surface areas and within the narrow gaps, each narrow gap sheltering at least a portion of the semiconductor material to provide sheltered semiconductor material;
• removing semiconductor material from the large surface areas and a top surface of the paired second conductors and pixel elements;
• depositing a liquid crystal display layer upon the paired second conductor, pixel electrode and sheltered semiconductor material;
• depositing a translucent conductor upon the liquid crystal display layer.

A method of making an active matrix display, comprising:

• providing a plurality of parallel first conductors upon a substrate;
• depositing a gate dielectric upon the first conductor;
• providing a plurality of parallel second conductors upon the gate dielectric, the second conductors crossing the first conductors;
• providing a plurality of pixel electrodes upon the gate dielectric, each pixel electrode defined by a contiguous outer perimeter, each pixel electrode disposed such that a first portion of the outer perimeter is adjacent to a second conductor and defines a narrow gap between the second conductor and the pixel electrode, the remaining portion of the outer perimeter being remote from other pixel electrodes and second conductors;
• depositing a semiconductor material over the second conductors and the pixel electrodes and the within each narrow gap, each narrow gap sheltering at least a portion of the semiconductor material to provide sheltered semiconductor material;
• removing semiconductor material from the large surface areas and a top surface of the paired second conductors and pixel elements;
• depositing a liquid crystal display layer upon the paired second conductor, pixel electrode and the sheltered semiconductor material;
• depositing a translucent conductor upon the liquid crystal display layer.