Thin-film piezoelectric element and method of making same
AssigneeTDK Corporation
InventorsKenichi Tochi, Takao Noguchi, Hiroshi Yamazaki, Ken Unno, Masahiro Miyazaki, Shigeru Shoji
Life of this patent
Estimating the term…
Loading patent…
AssigneeTDK Corporation
InventorsKenichi Tochi, Takao Noguchi, Hiroshi Yamazaki, Ken Unno, Masahiro Miyazaki, Shigeru Shoji
Estimating the term…
Provided is a thin-film piezoelectric element which reduces the influence of an oxide film left on the electrode film on the degradation of element characteristics, and a method of making the thin-film piezoelectric element. The thin-film piezoelectric element has ZrO2 as the main component of the outermost layer of the oxide film which covers the laminate. Young's modulus of the ZrO2 is 190 GPa, giving a significantly low value compared with Young's modulus of MgO, 245 GPa. Consequently, the influence of the oxide film on the reduction in the displacement magnitude of the piezoelectric film is smaller than the influence of the MgO thin film left in the conventional thin-film piezoelectric element. As a result, the thin-film piezoelectric element decreases the influence of the oxide film on the degradation of element characteristics compared with the conventional thin-film piezoelectric element.
A thin-film piezoelectric element comprising a laminate consisted of a plurality of piezoelectric laminates stacking on each other via an adhesive layer, each of which piezoelectric laminates having a structure wherein a piezoelectric film is sandwiched between a pair of electrode films,
Dependencies are inferred from the claim text.