Laser annealing apparatus
AssigneeAu Optronics Corporation
InventorYi-Chang Tsao
Life of this patent
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Abstract
An excimer laser annealing apparatus and the application of the same for stabilizing the atmosphere surrounding an area irradiated by an excimer laser. The apparatus includes a chamber, a gas diversion nozzle, an excimer laser and a gas supply device. The gas diversion nozzle is positioned inside the chamber. The laser beam produced by the excimer laser passes through the gas diversion nozzle. The gas supply device connects with the gas diversion nozzle for providing a jet of gas to the laser-irradiated area and carrying away any pollutants from the irradiated area.
Claims17
A laser annealing apparatus, comprising:
- a chamber;
- a movable device positioned inside the chamber;
- a gas diversion nozzle positioned inside the chamber close to the movable device to target at a location on the movable device;
- a laser source for emitting a beam of laser into the chamber, wherein the laser beam passes through the gas diversion nozzle to target at the location on the movable device;
- and
- a gas supply device directly connected with the gas diversion nozzle for delivering a jet of gas comprising at least a channel doping element to the laser-irradiated location on the movable device.
A laser annealing apparatus, comprising:
- a chamber;
- a movable device positioned inside the chamber;
- a gas diversion nozzle positioned inside the chamber close to the movable device to target at a location on the movable device;
- a laser source for emitting a beam of laser into the chamber, wherein the laser beam passes through the gas diversion nozzle to target at the location on the movable device;
- and
- a gas supply device directly connected with the gas diversion nozzle for delivering a jet of gas comprising nitrogen gas to the laser-irradiated location on the movable device.
Dependencies are inferred from the claim text.