Method for manufacturing a transparent element with invisible electrodes
AssigneeAsulab S.A.
InventorsJoachim Grupp, Gian-Carlo Poli
Life of this patent
Estimating the term…
Abstract
A conductive pattern, made of a transparent conductive oxide, such as ITO including electrodes (2) and conductive paths (4) is formed on one face of a transparent substrate (3) made of sapphire or toughened glass, then coated with a first layer (5) of a transparent dielectric with a low refractive index, such as MgF2 or LiF2, and then a second layer (7) of another transparent dielectric having a higher refractive index than the first, such as Al2O3, Ta2O5 or DLC.
Claims11
A method of manufacturing a transparent element with invisible electrodes formed by a transparent substrate one face of which is provided with a conductive pattern formed by electrodes, conductive paths and contact zones, wherein it includes the steps of:
- depositing over the entire surface of the substrate a transparent conductive oxide film (TCO), removing via etching through a mask the zones of TCO that do not form the conductive pattern, then the residual parts of the mask, to form the invisible electrodes of the transparent element;
- depositing a first layer of a transparent dielectric material, having a low refractive index (L), directly at least on the conductive patterned TCO;
- and
- depositing directly at least on the first layer a second layer of another transparent dielectric material having a high refractive index (H) relative to that of the first layer.
Dependencies are inferred from the claim text.