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US 7,243,411 B2Granted
Method for protecting write head coil during write pole/shaping
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsDavid P. Druist, Aron Pentek
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Abstract
A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
Claims21
A method for protecting write head coil during write pole notching, comprising:
- plating a magnetic pole;
- depositing an ion mill-resistant etchable material for providing an ion mill-resistant mask to protect a coil structure of a write head;
- depositing a photoresist mask on the ion mill-resistant mask;
- patterning the photoresist mask using photolithography;
- transferring the pattern of the photoresist mask into the ion mill-resistant mask using reactive ion etching;
- and
- performing ion milling to trim and shape the magnetic pole while the ion mill-resistant mask prevents ion milling of the coil structure.
4 more elements
Dependencies are inferred from the claim text.