Loading patent…
AssigneeDaikin Industries, Ltd.
InventorsTakayuki Araki, Yuzo Komatsu, Meiten Koh
Estimating the term…
There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.
A fluorine-containing ethylenic monomer having hydroxyl represented by the formula (1a):
A fluorine-containing ethylenic monomer having hydroxyl represented by the formula (2):
A fluorine-containing ethylenic monomer having hydroxyl represented by the formula (3):
A fluorine-containing ethylenic monomer having hydroxyl represented by the formula (5):
A fluorine-containing polymer having a number average molecular weight of from 500 to 1,000,000 represented by the formula (7):
Dependencies are inferred from the claim text.