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US 7,208,417 B2Granted
Apparatus and method for supplying chemicals
AssigneeFujitsu Limited
InventorNaoki Hiraoka
Life of this patent
Estimating the term…
Abstract
A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
Claims10
A method for producing a semiconductor device comprising the steps of:
- mixing a plurality of stock chemicals to prepare a mixture in a first tank;
- supplying the mixture from the first tank to a CMP processing unit;
- starting preparation of a new batch of the mixture in a second tank when the liquid level of the mixture in the first tank drops to a first predetermined value;
- and
- supplying the mixture prepared in the second tank to the CMP processing unit when the liquid level of the mixture in the first tank drops to a second predetermined value.
2 more elements
A method for producing an integrated circuit device comprising the steps of:
- preparing a slurry by mixing a plurality of stock chemicals in a first tank and a second tank;
- and
- supplying the mixture from one of the first tank and the second tank to a wafer,
- wherein when the liquid level of the slurry in one of the first tank and the second tank reaches a predetermined level, said step of preparing the slurry includes starting preparation of a new batch of the slurry in another one of the first tank and the second tank.
1 more element
Dependencies are inferred from the claim text.