Micro electromechanical systems for delivering high purity fluids in a chemical delivery system

A fluid distribution system comprising:

• a process fluid supply source including a process fluid;
• a first process block in fluid communication with the fluid supply source, the first process block comprising:
• a pressurization supply channel disposed within the first process block and extending between a pressurization inlet port to receive a pressurization fluid from a pressurization fluid supply source and a pressurization outlet port to facilitate delivery of the pressurization fluid to the process fluid supply source for pressurizing the process fluid disposed within the process fluid supply source;
• a process delivery channel disposed within the first process block and extending between a process inlet port to receive fluid from the process fluid supply source and a process outlet port to deliver process fluid from the first process block to a first delivery line;
• a purge channel disposed within the first process block and extending between a purge inlet port to receive a purge fluid from a purge fluid supply source and a purge outlet port to deliver fluid to a purge fluid collection site;
• and
• a plurality of valves at least partially formed within the first process block;
• wherein the pressurization supply channel, the process delivery channel and the purge channel are in fluid communication with each other and at least one valve is in fluid communication with each channel to facilitate selective isolation of each channel with respect to the other channels within the first process block.

A method of operating a combined flow meter and internal purge system, the system including a main flow path, a first shut-off valve in fluid communication with the main flow path, a second shut-off valve in fluid communication with the main flow path, a flow meter supposed between the first and second shut-off valves, the flow meter including a sensor and a control valve in fluid communication with the main flow path, and a purge delivery line including a purge inlet flow path in fluid communication with the main flow path and a purge inlet port and a purge outlet flow path in fluid communication with the main flow path and a purge outlet port, the purge fluid inlet flow path including a third shut-off valve and being disposed between the first shut-off valve and the flow meter, and the purge outlet flow path including a fourth shut-off valve and being disposed between the flow meter and the second shut-off valve, the method comprising:

• (a) facilitating fluid communication between the main flow path and a process fluid supply source;
• (b) opening the first and second shut-off valves, while the third and fourth shut-off valves are closed, to facilitate the flow of a process fluid through the main flow path from the process fluid supply source;
• (c) measuring a physical property of the process fluid flowing through the main flow path with the sensor and manipulating the control valve to control the flow rate of the process fluid based upon the measured physical property;
• (d) selectively closing the first and second shut-off valves to prevent the flow of the process fluid through the main flow path;
• (e) facilitating fluid communication between the purge inlet port and a purge fluid supply source and the purge outlet port and a purge fluid collection source;
• and
• (f) opening the third and fourth shut-off valves, while the first and second shut-off valves are closed, to facilitate a flow of purge fluid from the purge fluid collection source, through the purge fluid inlet flow path, the main flow path and the purge fluid outlet path to the purge fluid collection site.

A method of delivering a process fluid from a storage location to a delivery site, the method comprising:

• (a) providing a first process block in fluid communication with a fluid supply source, the first process block including a pressurization supply channel disposed within the first process block and extending between a pressurization inlet port and a pressurization outlet port, a process delivery channel disposed within the first process block and extending between a process inlet port and a process outlet port, a purge channel disposed within the first process block and extending between a purge inlet port and a purge outlet port, and a plurality of valves at least partially formed within the first process block, wherein the pressurization supply channel, the process delivery channel and the purge channel are all in fluid communication with each other and at least one valve is in fluid communication and associated with each channel;
• (b) facilitating fluid communication between the pressurization inlet port and a pressurization fluid supply source and between the pressurization outlet port and the process fluid supply source;
• (c) pressurizing process fluid disposed within the process fluid supply source by flowing pressurization fluid from the pressurization fluid supply source through the pressurization supply channel and into the process fluid supply source;
• (d) facilitating fluid communication between the process inlet port and the process fluid supply source and between the process outlet port and a first delivery line;
• (e) flowing process fluid from the process fluid supply source through the process delivery channel and into the first delivery line;
• (f) facilitating fluid communication between the purge inlet port and a purge fluid supply source and between the purge outlet port and a purge fluid collection site;
• and
• (g) manipulating at least one valve associated with each channel so as to selectively isolate at least one of the pressurization supply channel, the process delivery channel and the purge channel from the other channels.

A semiconductor processing fluid distribution system comprising:

• a semiconductor processing tool;
• and
• a block including at least one channel formed within the block and a plurality of valves at least partially formed within the block and in fluid communication with the at least one channel, the at least one channel including:
• a pressurization supply flow path to deliver a pressurization fluid from a pressurization fluid supply source to a process fluid supply source;
• and
• a purge floe path to deliver a purge fluid from a purge fluid supply source into and through portions of the at least one channel;
• wherein the block supplies a process fluid originating from the process fluid supply source to the semiconductor processing tool.

A semiconductor processing fluid distribution system comprising:

• a semiconductor processing tool;
• and
• a block including at least one channel formed within the block and a flow meter comprising a pressure sensor and a control valve at least partially formed within the block and in fluid communication with the at least one channel, the at least one channel including an inlet purge channel disposed upstream of the pressure sensor and the control valve, and an outlet purge channel disposed downstream of the pressure sensor and the control valve, the inlet purge channel is in fluid communication with a purge fluid supply source to facilitate delivery of a purge fluid from the purge fluid supply source and through the at least one channel between the inlet and outlet purge channels;
• wherein the at least one channel receives a process fluid from a process fluid supply source and the flow meter selectively controls the flow rate of the process fluid for delivery to the semiconductor processing tool.

A method of providing a process fluid to a semiconductor processing tool, the method comprising:

• fluid distribution system comprising:
• (a) providing a block including at least one channel formed within the block and a plurality of valves at least partially formed within the block and in fluid communication with the at least one channel;
• (b) pressurizing a process fluid disposed within a process fluid supply source by delivering a pressurization fluid from a pressurization fluid supply source to the process fluid supply source via a pressurization flow path of the at least one channel;
• (c) purging portions of the at least one channel by delivering a purge fluid from a purge fluid supply source into and through the portions of the at least one channel via a purge flow path of the at least one channel;
• and
• (d) supplying a process fluid originating from the process fluid supply source to the semiconductor processing tool via the block.

A method of providing a process fluid to a semiconductor processing tool, the method comprising:

• fluid distribution system comprising:
• (a) providing a block including at least one channel formed within the block and a flow meter comprising a pressure sensor and a control valve at least partially formed within the block and in fluid communication with the at least one channel, the at least one channel including an inlet purge channel disposed upstream of the pressure sensor and the control valve, and an outlet purge channel disposed downstream of the pressure sensor and the control valve;
• (b) receiving a process fluid from a process fluid supply source into the at least one channel;
• (c) controlling the flow rate of the process fluid flowing within the at least one channel for delivery to the semiconductor processing tool via the flow meter;
• and
• (d) flowing a purge fluid supplied from a purge fluid supply source through the at least one channel between the inlet and outlet purge channels at selected periods during system operation.