Method for doping quantum dots
AssigneeIndustrial Technology Research Institute
InventorsHsueh-Shih Chen, Dai-Luon Lo, Chien-Ming Chen, Gwo-Yang Chang
Life of this patent
Estimating the term…
Loading patent…
AssigneeIndustrial Technology Research Institute
InventorsHsueh-Shih Chen, Dai-Luon Lo, Chien-Ming Chen, Gwo-Yang Chang
Estimating the term…
A doping method for forming quantum dots is disclosed, which includes following steps: providing a first precursor solution for a group II element and a second precursor solution for a group VI element; heating and mixing the first precursor solution and the second precursor solution for forming a plurality of II–VI compound cores of the quantum dots dispersing in a melting mixed solution; and injecting a third precursor solution for a group VI element and a forth precursor solution with at least one dopant to the mixed solution in turn at a fixed time interval in order to form quantum dots with multi-shell dopant; wherein the dopant described here is selected from a group consisting of transitional metal and halogen elements. This method of the invention can dope the dopants in the inner quantum dot and enhance the emission intensity efficiently.
A method for doping quantum dots, comprising the steps of:
Dependencies are inferred from the claim text.